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MOS Transistor Switching Characteristics

A MOSFET is a voltage-controlled, majority-carrier device. An enhancement NMOS is OFF for VGS<VthV_{GS}<V_{th} and conducts when a positive gate overdrive VOV=VGS−VthV_{OV}=V_{GS}-V_{th} creates an inversion channel. Its insulated gate draws negligible steady current, although gate charge must be supplied at every transition.

Drain Characteristics and Switching Regions

Section titled “Drain Characteristics and Switching Regions”

For an enhancement NMOS, neglecting channel-length modulation,

ID={0,VGS<Vth,μnCoxWL[(VGS−Vth)VDS−VDS22],0≤VDS<VGS−Vth,12μnCoxWL(VGS−Vth)2,VDS≥VGS−Vth.I_D=\begin{cases} 0, & V_{GS}<V_{th},\\[2pt] \mu_nC_{ox}\dfrac WL\left[(V_{GS}-V_{th})V_{DS}-\dfrac{V_{DS}^2}{2}\right], & 0\leq V_{DS}<V_{GS}-V_{th},\\[7pt] \dfrac12\mu_nC_{ox}\dfrac WL(V_{GS}-V_{th})^2, & V_{DS}\geq V_{GS}-V_{th}. \end{cases}

Native MOSFET drain-characteristic family and pinch-off locus; V_(GS3) > V_(GS2) > V_(GS1) > V_(th).

Native MOSFET drain-characteristic family and pinch-off locus; VGS3>VGS2>VGS1>VthV_{GS3}>V_{GS2}>V_{GS1}>V_{th}.

RegionConditionSwitch interpretation
CutoffVGS<VthV_{GS}<V_{th}ID≈0I_D\approx0: open switch; VDS≈VDDV_{DS}\approx V_{DD}.
TriodeVGS>VthV_{GS}>V_{th}, VDS<VOVV_{DS}<V_{OV}Closed switch represented by RDS(on)R_{DS(on)}; this is the desired steady ON state.
SaturationVGS>VthV_{GS}>V_{th}, VDS≥VOVV_{DS}\geq V_{OV}Current-source region, crossed during hard switching and used for amplification.

For small VDSV_{DS},

MOSFET switch and its DC load-line endpoints.

MOSFET switch and its DC load-line endpoints.

The gate driver charges CGSC_{GS} and CGDC_{GD}; the data-sheet input capacitance is Ciss=CGS+CGDC_{iss}=C_{GS}+C_{GD}. Turn-on occurs in three useful stages:

  1. VGSV_{GS} rises to VthV_{th} while ID≈0I_D\approx0 (delay time).

  2. IDI_D rises to the load current; VGSV_{GS} reaches the plateau level.

  3. Gate-drain charge QGDQ_{GD} is supplied while VDSV_{DS} falls. This nearly flat part of VGSV_{GS} is the Miller plateau; afterward the gate rises to its final drive voltage.

Turn-off is the reverse sequence. A useful charge-based estimate is t≈Qg/Igt\approx Q_g/I_g; the simpler RC estimate is tr≈2.2RgCisst_r\approx2.2R_gC_{iss}.

Idealized gate-voltage and drain-voltage turn-on waveforms.

Idealized gate-voltage and drain-voltage turn-on waveforms.

FeatureBJTMOSFET
ControlBase-current controlledGate-voltage controlled
CarriersBipolar; minority charge storedUnipolar; no minority storage
Steady ON stateSaturation, VCE(sat)V_{CE(sat)}Deep triode, RDS(on)R_{DS(on)}
Dominant delayStorage time tst_sGate charge, especially QGDQ_{GD}
Drive powerContinuous VBEIBV_{BE}I_BDynamic QgVGSfsQ_gV_{GS}f_s
Conduction lossVCE(sat)ICV_{CE(sat)}I_CID,rms2RDS(on)I_{D,\mathrm{rms}}^2R_{DS(on)}
Temperature sharingThermal-runaway pronePositive RDS(on)R_{DS(on)} coefficient aids sharing
Typical strengthGain and low fixed ON dropFast switching and high integration density

Integrated MOSFET Fundamentals and Practical Effects

Section titled “Integrated MOSFET Fundamentals and Practical Effects”

The switching model is extended here with MOS construction, device types, symbols, static characteristics, circuit operation, second-order effects and a consolidated comparison matrix.

A MOSFET is a voltage-controlled, majority-carrier semiconductor device in which an electric field produced by the insulated gate controls the conductivity of a channel between source and drain. Ideally the gate draws no steady DC current; practical gate current is required only to charge and discharge capacitances during transitions.

A MOSFET has four physical terminals:

  • Gate (G): the control electrode, insulated by a thin oxide.

  • Source (S): the terminal from which the channel’s majority carriers enter.

  • Drain (D): the terminal through which those carriers leave.

  • Body or bulk (B): the semiconductor substrate. In most discrete three-terminal MOSFETs the body is internally connected to source.

Classification of MOSFETs by channel polarity and operating mode.

Classification of MOSFETs by channel polarity and operating mode.

SymbolMeaningSymbolMeaning
VGSV_{GS}Gate-to-source voltageVDSV_{DS}Drain-to-source voltage
IDI_DConventional drain currentVthV_{th}Threshold voltage
VOVV_{OV}Overdrive, VGS−VthV_{GS}-V_{th}CoxC_{ox}Oxide capacitance per unit area
W/LW/LChannel width-to-length ratioλ\lambdaChannel-length-modulation parameter
IDSSI_{DSS}Depletion-device current at VGS=0V_{GS}=0VGS(off)V_{GS(off)}Gate voltage that cuts off a depletion device

Cross-sections after a sufficient gate voltage has induced a channel. No conducting channel exists at V_(GS) = 0 in an enhancement MOSFET.

Cross-sections after a sufficient gate voltage has induced a channel. No conducting channel exists at VGS=0V_{GS}=0 in an enhancement MOSFET.

Consider a positive drain voltage and increase VGSV_{GS} from zero:

  1. Accumulation is absent: at VGS=0V_{GS}=0, the two n+n^+ regions form reverse-biased junctions with the P-body, so source and drain remain isolated.

  2. Depletion: a small positive gate voltage repels holes from the surface, leaving fixed negatively charged acceptor ions.

  3. Inversion: a larger positive voltage attracts electrons to the oxide interface. At VGS=VthV_{GS}=V_{th} the surface changes effectively from P-type to N-type.

  4. Conduction: for VGS>VthV_{GS}>V_{th} the inversion layer joins source and drain. A positive VDSV_{DS} drives electron flow from source to drain, while conventional IDI_D flows from drain to source.

For PMOS every semiconductor type and voltage polarity is reversed: an N-body contains p+p^+ source/drain regions, a sufficiently negative VGSV_{GS} creates a hole channel, and conventional current normally flows from source to drain. It is often clearer to use positive magnitudes VSGV_{SG} and VSDV_{SD} for PMOS analysis.

Standard insulated-gate FET symbols drawn with CircuitikZ. A broken channel denotes enhancement mode; a solid channel denotes depletion mode.

Standard insulated-gate FET symbols drawn with CircuitikZ. A broken channel denotes enhancement mode; a solid channel denotes depletion mode.

A depletion MOSFET is fabricated with a physical channel joining source and drain. Consequently it conducts at VGS=0V_{GS}=0.

For an N-channel depletion MOSFET:

  • VGS<0V_{GS}<0 repels electrons and narrows the channel (depletion operation). At VGS=VGS(off)<0V_{GS}=V_{GS(off)}<0, the channel is cut off.

  • VGS>0V_{GS}>0 attracts additional electrons and raises the current above IDSSI_{DSS} (enhancement operation).

The P-channel device has all polarities reversed.

Assume a long-channel enhancement NMOS with body tied to source and define

VOV=VGS−Vth,βn=μnCoxWL.V_{OV}=V_{GS}-V_{th},\qquad \beta_n=\mu_nC_{ox}\frac WL.
RegionConditionDrain current and meaning
CutoffVGS<VthV_{GS}<V_{th}ID≈0I_D\approx0. No strong inversion channel; the device acts as an open switch.
Triode, linear or ohmicVGS≥VthV_{GS}\geq V_{th} and 0≤VDS<VOV0\leq V_{DS}<V_{OV}ID=βn(VOVVDS−VDS2/2)I_D=\beta_n\left(V_{OV}V_{DS}-V_{DS}^2/2\right). The channel exists from source to drain and behaves as a voltage-controlled resistance.
Saturation or activeVGS≥VthV_{GS}\geq V_{th} and VDS≥VOVV_{DS}\geq V_{OV}ID=(βn/2)VOV2I_D=(\beta_n/2)V_{OV}^2 ideally. The channel pinches off near the drain; current is mainly controlled by VGSV_{GS}.

Conceptual channel shape in the three NMOS operating regions. In saturation the inversion channel ends before the drain, but the strong electric field carries electrons across the short pinch-off region.

Conceptual channel shape in the three NMOS operating regions. In saturation the inversion channel ends before the drain, but the strong electric field carries electrons across the short pinch-off region.

The channel voltage is not constant from source to drain. Let V(x)V(x) be the local channel potential measured from the source. The NMOS inversion charge per unit area is approximately

Qi(x)=−Cox[VGS−Vth−V(x)].Q_i(x)=-C_{ox}\bigl[V_{GS}-V_{th}-V(x)\bigr].

It is largest near the source, where V(x)≈0V(x)\approx0, and becomes smaller toward the drain as V(x)V(x) rises. At the drain end, V(L)=VDSV(L)=V_{DS}, so

Qi(L)=−Cox[VGS−Vth−VDS]=−Cox(VOV−VDS).Q_i(L)=-C_{ox}\bigl[V_{GS}-V_{th}-V_{DS}\bigr] =-C_{ox}(V_{OV}-V_{DS}).
  • Before pinch-off: When VDS<VOVV_{DS}<V_{OV}, the bracket remains positive even at the drain. A continuous inversion channel reaches from source to drain, so the MOSFET is in triode.

  • Pinch-off boundary: At VDS=VOV=VGS−VthV_{DS}=V_{OV}=V_{GS}-V_{th}, the inversion charge at the drain end becomes zero. In the ideal model the channel tapers to zero at the drain edge; this marks the beginning of saturation.

  • Current does not stop: Electrons travel through the inversion channel to the pinch-off point and are then swept rapidly across the short drain depletion region by its strong electric field. Pinch-off therefore does not mean an open circuit.

  • Beyond pinch-off: Extra VDSV_{DS} falls mainly across the pinch-off region rather than increasing channel charge. The ideal long-channel current is therefore nearly constant at ID=(βn/2)VOV2I_D=(\beta_n/2)V_{OV}^{2}.

At VDS=VOVV_{DS}=V_{OV}, the triode equation gives the same current as the saturation equation, so the mathematical model is continuous. In a real device, increasing VDSV_{DS} moves the pinch-off point slightly toward the source and shortens the effective channel. This channel-length modulation causes the small upward slope of the saturation curves.

Use magnitudes to avoid sign mistakes. For a PMOS define VSG=VS−VGV_{SG}=V_S-V_G, VSD=VS−VDV_{SD}=V_S-V_D, and ∣Vtp∣|V_{tp}|. Then it is:

  • ON when VSG≥∣Vtp∣V_{SG}\geq|V_{tp}|;

  • in triode when VSD<VSG−∣Vtp∣V_{SD}<V_{SG}-|V_{tp}|;

  • in saturation when VSD≥VSG−∣Vtp∣V_{SD}\geq V_{SG}-|V_{tp}|.

The current magnitude follows the same square-law equations with βp\beta_p. PMOS drain-end pinch-off begins at VSD=VSG−∣Vtp∣V_{SD}=V_{SG}-|V_{tp}|; holes continue across the high-field region just as electrons do in NMOS, with all polarities and carrier directions reversed.

Drain Characteristics: IDI_D versus VDSV_{DS}

Section titled “Drain Characteristics: IDI_DID​ versus VDSV_{DS}VDS​”

Enhancement-NMOS output characteristics. The small positive slope in saturation represents channel-length modulation; V_(GS3) > V_(GS2) > V_(GS1).

Enhancement-NMOS output characteristics. The small positive slope in saturation represents channel-length modulation; VGS3>VGS2>VGS1V_{GS3}>V_{GS2}>V_{GS1}.

At low VDSV_{DS} the device is approximately resistive:

Transfer Characteristics: IDI_D versus VGSV_{GS}

Section titled “Transfer Characteristics: IDI_DID​ versus VGSV_{GS}VGS​”

Conceptual transfer characteristics of all four MOSFET types. Current magnitudes are shown for P-channel devices.

Conceptual transfer characteristics of all four MOSFET types. Current magnitudes are shown for P-channel devices.

Low-side NMOS switch (left) and high-side PMOS switch (right). D, S, and G identify drain, source, and gate; the red arrow shows conventional current when the switch is ON. R_(pd) and R_(pu) define a safe OFF state when the controller output is floating; R_(g) limits peak gate current and controls ringing. A HIGH gate drive turns the NMOS ON; a LOW control voltage turns the PMOS ON.

Low-side NMOS switch (left) and high-side PMOS switch (right). DD, SS, and GG identify drain, source, and gate; the red arrow shows conventional current when the switch is ON. RpdR_{pd} and RpuR_{pu} define a safe OFF state when the controller output is floating; RgR_g limits peak gate current and controls ringing. A HIGH gate drive turns the NMOS ON; a LOW control voltage turns the PMOS ON.

For the low-side NMOS switch:

  • NMOS OFF: VGS<VthV_{GS}<V_{th}, ID≈0I_D\approx 0, and VDS≈VDDV_{DS}\approx V_{DD}.

  • NMOS ON: The driver must provide the data-sheet test gate voltage, not merely exceed VthV_{th}. The device operates in deep triode and VDS(on)≈IDRDS(on)V_{DS(on)}\approx I_DR_{DS(on)}.

Voltage-Divider-Biased Common-Source Amplifier

Section titled “Voltage-Divider-Biased Common-Source Amplifier”

Common-source amplifier with divider bias, source stabilization and an optional AC bypass capacitor C_(S).

Common-source amplifier with divider bias, source stabilization and an optional AC bypass capacitor CSC_S.

For negligible gate current,

VG≈VDDR2R1+R2,VS=IDRS,VGS=VG−VS,VDS=VDD−ID(RD+RS).V_G\approx V_{DD}\frac{R_2}{R_1+R_2},\quad V_S=I_DR_S,\quad V_{GS}=V_G-V_S,\quad V_{DS}=V_{DD}-I_D(R_D+R_S).

The bias point must satisfy the saturation test VDS≥VGS−VthV_{DS}\geq V_{GS}-V_{th}. With CSC_S effective at signal frequency, the approximate midband gain is Av≈−gm(RD∥ro∥RL)A_v\approx-g_m(R_D\parallel r_o\parallel R_L); without bypassing, source degeneration lowers gain but improves linearity and bias stability.

The insulated gate is not an open circuit during switching. Important capacitances are CGSC_{GS}, CGDC_{GD} and CDSC_{DS}, with Ciss=CGS+CGDC_{iss}=C_{GS}+C_{GD}. The gate-drain capacitance causes the Miller plateau while the drain voltage changes.

Idealized hard-switching turn-on sequence. I_(D) rises before V_(DS) falls; their overlap produces switching loss.

Idealized hard-switching turn-on sequence. IDI_D rises before VDSV_{DS} falls; their overlap produces switching loss.

  1. The driver charges the gate to VthV_{th}; drain current is still nearly zero.

  2. Drain current rises to the load current as VGSV_{GS} approaches the plateau voltage.

  3. Gate-drain charge QGDQ_{GD} is supplied while VDSV_{DS} falls. Gate voltage remains nearly constant at the Miller plateau.

  4. After the plateau, the gate reaches its final drive voltage and RDS(on)R_{DS(on)} reaches its specified low value.

EffectPhysical resultPractical consequence
Channel-length modulationPinch-off point moves toward source as VDSV_{DS} increasesSaturation curves slope upward; finite ror_o lowers amplifier gain.
Body effectSource-body reverse bias raises NMOS thresholdUse Vth=Vth0+γ(2ϕF+VSB−2ϕF)V_{th}=V_{th0}+\gamma(\sqrt{2\phi_F+V_{SB}}-\sqrt{2\phi_F}).
Subthreshold conductionWeak inversion current remains below thresholdCutoff current is not exactly zero; leakage matters in low-power ICs.
Body diodeBody-source connection forms an intrinsic diodeIt conducts reverse current in power circuits and has reverse-recovery implications.
Temperature riseMobility falls and power-device RDS(on)R_{DS(on)} usually risesUse hot RDS(on)R_{DS(on)}, thermal resistance and safe operating area.
Avalanche and oxide stressExcess VDSV_{DS} avalanches the drain junction; excess VGSV_{GS} damages oxideNever exceed absolute maximum ratings; clamp inductive transients and gate spikes.
PropertyN-enhancementP-enhancementN-depletionP-depletion
At VGS=0V_{GS}=0OFF; no channelOFF; no channelON; channel existsON; channel exists
Major carriersElectronsHolesElectronsHoles
Gate actionPositive VGSV_{GS} turns ONNegative VGSV_{GS} turns ONNegative depletes; positive enhancesPositive depletes; negative enhances
Cutoff voltageVGS<+VthV_{GS}<+V_{th}$V_{SG}<V_{tp}$
Symbol channelBrokenBrokenSolidSolid
Usual current directionD to SS to DD to SS to D
Typical useLow-side switch, CMOS pull-downHigh-side switch, CMOS pull-upCurrent source, special analog circuitsLess common complementary analog use
FeatureMOSFETBJT
Control variableGate voltage and gate chargeBase current
Carrier mechanismMajority-carrier, unipolarBoth carrier types, bipolar
Input resistanceExtremely high at DCFinite because base-emitter junction conducts
Steady ON modelRDS(on)R_{DS(on)} in deep triodeVCE(sat)V_{CE(sat)} in saturation
Dynamic limitationGate and Miller chargeStored minority charge and base charge
Conduction lossID,rms2RDS(on)I_{D,\mathrm{rms}}^2R_{DS(on)}Approximately VCE(sat)ICV_{CE(sat)}I_C
Thermal sharingPositive RDS(on)R_{DS(on)} coefficient often helpsThermal runaway is more problematic